发明名称 Use of silicon block process step to camouflage a false transistor
摘要 A technique for and structures for camouflaging an integrated circuit structure. A layer of conductive material having a controlled outline is disposed to provide artifact edges of the conductive material that resemble an operable device when in fact the device is not operable.
申请公布号 US2004099912(A1) 申请公布日期 2004.05.27
申请号 US20030637848 申请日期 2003.08.07
申请人 HRL LABORATORIES, LLC. 发明人 CHOW LAP-WAI;CLARK WILLIAM M.;HARBISON GAVIN J.;BAUKUS JAMES P.
分类号 H01L23/58;H01L27/02;(IPC1-7):H01L29/76 主分类号 H01L23/58
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