COMPOSITION FOR POROUS FILM FORMATION, POROUS FILM, PROCESS FOR PRODUCING THE SAME, INTERLAYER INSULATION FILM AND SEMICONDUCTOR DEVICE

摘要

A composition for film formation from which a porous film of practical mechanical strength can be prepared through simple processing at low cost; a porous film and a process for producing the same; and a highly reliable semiconductor device of low cost and high performance wherein the porous film is incorporated. In particular, a composition for porous film formation, comprising a polymer obtained by hydrolytic condensation of at least one silane compound of the general formula: (R<1>)a Si (R<2>)4-a (1), preferably a polymer obtained by co-hydrolytic condensation of at least one silane compound of the general formula (1) and at least one silane compound of the general formula: (R<3>)b Si (R<4>)4-b (2). Further, there is provided a process for producing the porous film, comprising the steps of coating with the above film formation composition and forming pores.