发明名称 |
PHOTOSENSITIVE DRY FILM RESIST HAVING ION SCAVENGER LAYER, AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive dry film resist having an ion scavenger layer capable of exhibiting not only excellent photosensitivity and heat resistance but also excellent electric reliability, and to provide a method for manufacturing the same. <P>SOLUTION: The photosensitive dry film resist has the ion scavenger layer in addition to at least a photosensitive film layer, in which the ion scavenger included in the ion scavenger layer preferably has capability to make coordinate bonding with metal ions. As a result, the ion migration resistance of the photosensitive dry film resist can be improved and the degradation in the electric reliability is efficiently averted while the properties, such as photosensitivity and heat resistance, of the resist are maintained. <P>COPYRIGHT: (C)2004,JPO |
申请公布号 |
JP2004151394(A) |
申请公布日期 |
2004.05.27 |
申请号 |
JP20020316800 |
申请日期 |
2002.10.30 |
申请人 |
KANEGAFUCHI CHEM IND CO LTD |
发明人 |
OKADA YOSHIFUMI;KOKAWARA KAORU;YAMANAKA TOSHIO;TAKIGUCHI TOMOTERU |
分类号 |
G03F7/004;G03F7/11;H05K3/00 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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