| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a pattern capable of controlling an inner structure and providing a hollow pattern by a simple process not requiring a drying process. SOLUTION: The method for forming the hollow pattern forms a pattern containing cavities in a plane by a means including at least processes of (1)-(3). (1) A layer changing a compatible state of a photopolymerizable compound and a solvent according to temperature is formed by using a liquid coating agent comprising the photopolymerizable compound, solvent and a photopolymerizable initiator. (2) A phase substantially not containing the cavities is formed with application of an active energy ray in the compatible state of the photopolymerizable compound and solvent. (3) After the layer is cured with the application of the active energy ray in a phase-separation state of the photopolymerizable compound and solvent, the solvent dispersed in the layer is volatilized, thereby a phase containing the hollows is formed. COPYRIGHT: (C)2004,JPO
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