METHOD FOR PREPARING THIN GOLD FILM FLAT AT ATOMIC LEVEL

摘要

PROBLEM TO BE SOLVED: To provide a method for preparing a thin gold film flat at the atomic level on a mica substrate by a vacuum deposition method with a simple operation. SOLUTION: The problem is solved by investigating the pretreatment method for a mica substrate and the conditions such as degree of vacuum, vapor deposition temperature, vapor deposition rate, and film thickness in the vacuum deposition method. The thin gold film is formed by the following operations: an 8 mm×12 mm mica substrate with its surface cleaved in the air is heat treated in a vacuum of 1-8×10-6Torr at 550°C for 2 hr and then kept at 473°C in a vacuum of 1-3×10-6Torr; and a thin gold film with a thickness of 150 nm is vapor deposited at a vapor deposition rate of 2.0 nm/s and then cooled in a vacuum of 1-3×10-6Torr to lower than 100°C. COPYRIGHT: (C)2004,JPO