发明名称 Substrate sheet material for a semiconductor device and a manufacturing method thereof, a molding method using a substrate sheet material, a manufacturing method of semiconductor devices
摘要 A substrate sheet material for semiconductor device and manufacturing method thereof and a manufacturing method of a semiconductor device using the substrate sheet material can suppress and reduce a warp which may occur in the substrate sheet material even when a plurality of semiconductor chips formed in the substrate sheet material are molded all at once. A plurality of substrates to be used for producing semiconductor packages are formed in the substrate sheet material. An outer configuration of the substrate sheet material is made into a circular shape.
申请公布号 US2004099943(A1) 申请公布日期 2004.05.27
申请号 US20030718677 申请日期 2003.11.24
申请人 FUJITSU LIMITED 发明人 MEGURO KOUICHI;NISHINO TORU;HAYASAKA NOBORU
分类号 H01L21/48;H01L21/56;H01L23/31;(IPC1-7):H01L23/28;H01L23/48;H01L21/44;H01L21/50;H01L29/40 主分类号 H01L21/48
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