| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for irradiating a laser beam with high production efficiency using a CW laser, and to provide a laser irradiator for use therein. SOLUTION: Assuming the length of one side of a rectangular substrate deposited with a semiconductor film is b, the scanning speed is V, and the acceleration required for increasing the relative speed of the substrate to a laser beam up to the scanning speed V is g, following relation is satisfied, V=(gb/5.477)<SP>1/2</SP>. A method for irradiating a laser beam in which the time required for laser annealing is minimized is thereby provided. Although the acceleration g is assumed constant, a time averaged value is employed if the acceleration varies. COPYRIGHT: (C)2004,JPO |
