发明名称 METHOD FOR MANUFACTURING REFLECTIVE SUBSTRATE AND METHOD FOR MANUFACTURING ELECTRO-OPTIC DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a reflective substrate capable of manufacturing rugged shapes of a reflection surface more rapidly than heretofore at a lower cost and a method for manufacturing an electro-optic device. <P>SOLUTION: A photosensitive resin 101 formed on a substrate 111 is subjected to exposure using a mask 102. The exposure is performed in such a manner that the exposure intensity distribution on the surface of the photosensitive resin 101 is changed to increase and decrease curvilinearly along the surface by adequately setting a diameter D<SB>A</SB>and exposure gap G<SB>A</SB>in a light transmission section 102x of the mask 102. A resin layer 119 having the surface rugged shapes 119a is formed by exposing the resin at such exposure intensity distribution, thence developing the resin. A reflection layer 112 composed of a thin metallic film etc., is thereafter formed on the resin layer 119. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004151685(A) 申请公布日期 2004.05.27
申请号 JP20030294688 申请日期 2003.08.18
申请人 SEIKO EPSON CORP 发明人 OTAKE TOSHIHIRO;MATSUO MUTSUMI
分类号 G02B5/02;G02B5/08;G02F1/1335;H01L21/00;H01L51/52;H01L51/56 主分类号 G02B5/02
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