发明名称 GOLD PLATING LIQUID, PLATING METHOD USING THE GOLD PLATING LIQUID, METHOD OF PRODUCING ELECTRONIC COMPONENT, AND ELECTRONIC COMPONENT
摘要 PROBLEM TO BE SOLVED: To prevent the damage of bath stability, to further secure uniformity even to the object to be plated low in chemical resistance so as to prevent unevenness in precipitation, and to form a gold film having satisfactory denseness, desired solder wettability and excellent adhesion. SOLUTION: A nickel film 8 is formed on a copper electrode 7 formed on the surface of a glass ceramic substrate 6., and a gold film 9 is formed on the nickel film 8. Then, a gold plating liquid used for the formation of the gold film 9 comprises (1) a non-cyano-gold source, (2) sulfite as a complexing agent for gold, (3) aminocarboxylic acids as a stabilizer for gold, (4) oxycarboxylic acids as a masking reagent, (5) an antimony compound and/or a bismuth compound as a precipitation promotor, and (6) a thiol compound or the derivative thereof and/or a nitrogen-containing heterocyclic compound as a precipitation control agent. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004149824(A) 申请公布日期 2004.05.27
申请号 JP20020314130 申请日期 2002.10.29
申请人 MURATA MFG CO LTD 发明人 TAKANO YOSHIHIKO
分类号 C23C18/42;C23C18/52;H05K3/18;(IPC1-7):C23C18/42 主分类号 C23C18/42
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