| 摘要 |
PROBLEM TO BE SOLVED: To effectively remove dust inside a reaction vessel before applying the prescribed treatment to the substrate to be treated inside the reaction vessel. SOLUTION: In the reaction vessel 101, a treatment gas introduction nozzle 701 for introducing a treatment gas, and a clean gas introduction nozzle 702 for introducing a clean gas are arranged. A valve 502 is opened previous to a valve 503, so that the start of the introduction of the clean gas from the treatment gas introduction nozzle 701 is performed prior to that from the clean gas introduction nozzle 702. The introduction is performed in such a manner that the pressure inside the treatment gas introduction nozzle 701 is increased more than that inside the clean gas introduction nozzle 702. After the elapse of the set clean gas introduction time, the valve 503 is closed prior to the valve 502, so that the stop of the introduction of the clean gas from the clean gas introduction nozzle 702 is performed prior to that in the treatment gas introduction nozzle 701. COPYRIGHT: (C)2004,JPO
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