发明名称 RUNNING TYPE VACUUM DEPOSITION SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a running type vacuum deposition type system in which a main roll 3 obtained by providing the outer circumferential face of a metallic cylindrical body with a stacked coating consisting of an insulating film, an electroconductive film and a surface insulating film, and arranged inside a vacuum tank body 1 is provided, and, while running is performed in a state where a running film 7 is wound, a thin film is deposited on the running film, and wherein the occurrence of abnormal discharge inside the vacuum tank body 1 is prevented while utilizing the electrostatic adsorption effect between the main roll 3 and the running film 7. SOLUTION: A sliding brush part 16b on a fixing side connected to a power source 17 for applying voltage and a sliding brush part 16a on a rotation side slid and contacted with the brush 16b are placed at a main roll shaft 20 extendedly provided on the outside (on the air side) of the vacuum tank body 1. An electric wiring cable 14a connected to the electroconductive film and the sliding brush part 16a are connected via an electricity introduction port 15b so that they are located inside the shaft 20 and are also not interfered with a cooling medium passage inside the shaft 20. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004149845(A) 申请公布日期 2004.05.27
申请号 JP20020315586 申请日期 2002.10.30
申请人 SONY CORP 发明人 NISHIYAMA HIDETOSHI;MORIOKA TADAHIRO
分类号 C23C14/56;C23C16/54;(IPC1-7):C23C14/56 主分类号 C23C14/56
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