| 摘要 |
PROBLEM TO BE SOLVED: To provide an etching liquid for metals such as iron based metals and copper based metals with which an etching component with a high etch factor shape having high precision, high definition, and a fine pitch can be produced though it has been impossible with an etching liquid consisting of cupric chloride and ferric chloride and/or an additive added thereto. SOLUTION: The composition of the etching liquid consists of an aqueous solution of ferric perchlorate and an aqueous solution of ferric chloride, and free acid such as perchloric acid is added thereto, so that the pH of the liquid is controlled to≤6. COPYRIGHT: (C)2004,JPO
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