发明名称 |
Fine pattern forming method |
摘要 |
There is provided a method of forming a fine resist pattern in which a highly practicable photo-sensitive composition obtained from a material having a high transparency against an exposure light having a short wavelength such as F2 excimer laser beam is used as a resist, and the method of forming a fine resist pattern comprises a step for forming a photo-sensitive layer on a substrate or on a given layer on a substrate using a photo-sensitive composition comprising at least a compound generating an acid by irradiation of light and a compound having fluorine atom in its molecular structure, a step for exposing by selectively irradiating a given area of said photo-sensitive layer with energy ray, a step for heat-treating the exposed photo-sensitive layer, and a step for forming a fine pattern by developing the heat-treated photo-sensitive layer to selectively remove the exposed portion or un-exposed portion of the photo-sensitive layer.
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申请公布号 |
US2004101787(A1) |
申请公布日期 |
2004.05.27 |
申请号 |
US20030471050 |
申请日期 |
2003.09.08 |
申请人 |
NAITO TAKUYA;ISHIKAWA SEIICHI;TORIUMI MINORU;MIYOSHI SEIRO;YAMAZAKI TAMIO;WATANABE MANABU;ITANI TOSHIRO;ARAKI TAKAYUKI;KOH MEITEN |
发明人 |
NAITO TAKUYA;ISHIKAWA SEIICHI;TORIUMI MINORU;MIYOSHI SEIRO;YAMAZAKI TAMIO;WATANABE MANABU;ITANI TOSHIRO;ARAKI TAKAYUKI;KOH MEITEN |
分类号 |
G03F7/004;G03F7/038;G03F7/039;(IPC1-7):G03F7/039;G03F7/20;G03F7/30;G03F7/36;G03F7/38;G03F7/40 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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