发明名称 |
Large area source for uniform electron beam generation |
摘要 |
An electron beam apparatus that includes a vacuum chamber, a large-area cathode disposed in the vacuum chamber, and a first power supply connected to the cathode. The first power supply is configured to apply a negative voltage to the cathode sufficient to cause the cathode to emit electrons toward a substrate disposed in the vacuum chamber. The electron beam apparatus further includes an anode positioned between the large-area cathode and the substrate. The anode is made from aluminum. The electron beam apparatus further includes a second power supply connected to the anode, wherein the second power supply is configured to apply a voltage to the anode that is positive relative to the voltage applied to the cathode.
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申请公布号 |
US2004099817(A1) |
申请公布日期 |
2004.05.27 |
申请号 |
US20020301508 |
申请日期 |
2002.11.21 |
申请人 |
DEMOS ALEXANDROS T.;PONNEKANTI HARI K.;ZHAO JUN;ARMER HELEN R.;LIVESAY WILLIAM R.;WOODS SCOTT C. |
发明人 |
DEMOS ALEXANDROS T.;PONNEKANTI HARI K.;ZHAO JUN;ARMER HELEN R.;LIVESAY WILLIAM R.;WOODS SCOTT C. |
分类号 |
H01J37/06;H01J37/317;(IPC1-7):G21K5/02 |
主分类号 |
H01J37/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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