| 摘要 |
PROBLEM TO BE SOLVED: To provide a cantilever for an SPM, having a probe part of a high aspect ratio and made acute with sufficient controllability, and to provide its manufacturing method. SOLUTION: A mask 13 for probe part formation is formed on a silicon substrate 11 to form a step 15 by isotropic wet etching. The mask is removed to form a silicon nitride film 16 high in silicon content serving as a lever part and a probe part. The nitride film is patterned and etched to form the probe part 17 and the lever part 18. Then, with a protection film 19 provided on the lever part, low-temperature thermal-oxidation treatment is performed to form a silicon oxide film 20 only on an end part of the probe part. An acute portion serving as the end part of the probe part is formed on an unoxidized portion of the nitride film. Then, the oxide film 20 is removed by means of hydrofluoric acid to obtain the cantilever 24 for an SPM having the probe part of a high aspect ratio and made acute. COPYRIGHT: (C)2004,JPO |
