发明名称 METHOD AND APPARATUS FOR DEPOSITING CARBON FILM
摘要 PROBLEM TO BE SOLVED: To provide a method for depositing a carbon film having high adhesion to various base materials such as tools, sliding parts and precision/electronic equipment parts, and further, flexible organic material based base materials, to provide an apparatus therefor, to provide a carbon film obtained by using the method, and to provide a product coated with the carbon film. SOLUTION: In the method of vapor-depositing a carbon film on a base material under a vacuum, when an evaporating carbonacious material is deposited on the surface of the base material, a mixed ion beam of gas cluster ions and monomer ions is continuously or discontinuously applied. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004149838(A) 申请公布日期 2004.05.27
申请号 JP20020314895 申请日期 2002.10.29
申请人 NOMURA PLATING CO LTD 发明人 KITAGAWA AKIYUKI;TOYODA KISHO;YAMADA AKIRA;MATSUO JIRO
分类号 C23C14/32;C23C14/06;(IPC1-7):C23C14/32 主分类号 C23C14/32
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