发明名称 Nitride semiconductor with active layer of quantum well structure with indium-containing nitride semiconductor
摘要 A nitride semiconductor device has a nitride semiconductor layer structure. The structure includes an active layer of a quantum well structure containing an indium-containing nitride semiconductor. A first nitride semiconductor layer having a band gap energy larger than that of the active layer is provided in contact with the active layer. A second nitride semiconductor layer having a band gap energy smaller than that of the first layer is provided over the first layer. Further, a third nitride semiconductor layer having a band gap energy larger than that of the second layer is provided over the second layer.
申请公布号 US2004101012(A1) 申请公布日期 2004.05.27
申请号 US20030718652 申请日期 2003.11.24
申请人 发明人 NAKAMURA SHUJI;NAGAHAMA SHINICHI;IWASA NARUHITO
分类号 H01L33/02;H01L33/06;H01L33/32;H01S5/20;H01S5/343;(IPC1-7):H01L21/00;H01S5/00 主分类号 H01L33/02
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