发明名称 Copper electroplating bath
摘要 Copper electroplating baths are provided containing as one or more suppressor compounds poly(alkylene oxide) random copolymers which are capable of providing copper filled sub-micron sized apertures free of pits and voids. Such copper electroplating baths are useful in the manufacture of electronic devices, such as printed wiring boards and integrated circuits.
申请公布号 EP1422320(A1) 申请公布日期 2004.05.26
申请号 EP20030257256 申请日期 2003.11.18
申请人 SHIPLEY COMPANY, L.L.C. 发明人 MIKKOLA, ROBERT D.;WANG, DEYAN;WU, CHUNYI
分类号 C25D3/38;C25D7/06;C25D7/12;H01L21/288;H05K3/42;(IPC1-7):C25D3/38 主分类号 C25D3/38
代理机构 代理人
主权项
地址