| 摘要 |
A cleaning apparatus (9) for cleaning a peripheral part of a substrate holds a peripheral part of a substrate (1) between the elastic porous member (29) of an upper cleaning roller (16) and an elastic porous member (30) of a lower cleaning roller (17). The power of a drive motor (13) is transmitted through a drive pulley (18), a belt (26) and a driven pulley (24) to a rotating shaft (17a) to rotate the lower cleaning roller (17), and is transmitted through a drive pulley (22), a belt (25) and a driven pulley (23) to a rotating shaft (16a) to rotate the upper cleaning roller (16) in a direction opposite the direction in which the lower cleaning roller (17) is rotated. A cleaning liquid is supplied through cleaning liquid supply nozzles (31) and cleaning liquid supply pipes (31a) into core members (27, 28). Then the cleaning liquid flows through connecting holes (35) formed in the circumferential walls of the core members (27, 28) and permeates the elastic porous members (29, 30). In this state, the upper cleaning roller (16) and the lower cleaning roller (17) are rotated, and the upper cleaning roller (16) and the lower cleaning roller (17) are moved relative to the substrate (1) by a base (11) along the peripheral part of the substrate (1) held between the elastic porous members (29, 30) of the upper and the lower cleaning rollers (16, 17). Splashing of the cleaning liquid can be effectively prevented and the quality of a high-definition pattern formed on the substrate (1) can be preserved.
|
