发明名称 High chloride emulsion having high sensitivity and low fog
摘要 The invention provides a radiation sensitive emulsion comprised of a dispersing medium and silver iodochloride grainsWHEREIN the silver iodochloride grainsare partially bounded by {100} crystal faces satisfying the relative orientation and spacing of cubic grains andcontain from 0.05 to 1 mole percent iodide, based on total silver, with maximum iodide concentrations located nearer the surface of the grains than their centerand wherein said emulsion further comprises a thiosulfonate of Formula I and a sulfinate of Formula IIwherein Formula I iswhereinZ1 is alkyl, aryl, heteroaryl, arylalkyl, substituted aryl or a polymeric backbone wherein the thiosulfonate group is repeated andM1 is a monovalent metal or a tetraalkylammonium cation, andFormula II iswhereinZ2 is alkyl, aryl, heteroaryl, arylalkyl, substituted aryl or a polymeric backbone wherein the sulfinate group is repeated andM2 is a monovalent metal or a tetraalkylammonium cation.
申请公布号 US6740482(B1) 申请公布日期 2004.05.25
申请号 US19940362107 申请日期 1994.12.22
申请人 EASTMAN KODAK COMPANY 发明人 CHEN BENJAMIN TEH-KUNG;LOK ROGER
分类号 G03C7/00;G03C1/035;G03C1/34;G03C7/392;(IPC1-7):G03C1/005;G03C1/494 主分类号 G03C7/00
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