| 摘要 |
An exposure device in which a device for insertion or removal of the microscope for mask marks is not necessary, and in which the arrangement of the device is simplified is achieved by the provision of a microscope for mask marks in a workpiece carrier which can move in unison with the workpiece carrier. Furthermore, a reference mark is provided in the light incidence part of the microscope for determining the mask marks. The relation between the positions of the microscope for workpiece marks, the microscope for mask marks and the workpiece carrier is confirmed beforehand using this reference mark. In the positioning of the mask relative to the workpiece, the workpiece carrier is moved and the microscope for workpiece marks determines the position of the workpiece mark. Then, the workpiece carrier is moved and the microscope for mask marks determines the projection position of the mask mark. The workpiece carrier is driven such that the two agree with one another. In this way, the mask and the workpiece are positioned relative to one another.
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