| 摘要 |
<p>In a preprocess, in a state in which the positional relation between the space positions of incidence points of laser light (LB) on a test substrate (11) and a target (12) prepared for information collection is fixed, information about the distribution of film thickness on the test substrate with the film deposited according to given irradiation time is obtained in advance while irradiating the target (12) with laser light (LB) or irradiating the target (12) with laser light (LB) while rotating the test substrate. In this process, the deposition time in each relative positional relation is adjusted on the basis of the film thickness distribution information obtained in advance in the preprocess while relatively rotating the incidence points of laser light (LB) on the substrate (11) or the substrate holder (21) and target (12) around a particular rotation axis or relatively spatially moving them, or while simultaneously effecting such relative rotation and relative movement.</p> |
