| 发明名称 |
METHOD FOR OXIDATION OF A LAYER AND CORRESPONDING HOLDER DEVICE FOR A SUBSTRATE |
| 摘要 |
Amongst other things a method is disclosed, whereby a layer for oxidation is preferably processed in a single substrate process, whereby the process temperature during the processing is recorded directly on the substrate or on a holder device (110) for the substrate. Oxide layers with precisely fixed oxide widths can be generated. |
| 申请公布号 |
WO2004015754(A3) |
申请公布日期 |
2004.05.21 |
| 申请号 |
WO2003DE02523 |
申请日期 |
2003.07.26 |
| 申请人 |
INFINEON TECHNOLOGIES AG;CHUNG, HIN-YIU;GUTT, THOMAS |
发明人 |
CHUNG, HIN-YIU;GUTT, THOMAS |
| 分类号 |
H01L21/00;H01L21/316;H01L21/322;H01L21/324;H01L21/687;H01S5/183 |
主分类号 |
H01L21/00 |
| 代理机构 |
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