Asymmetric, disubstituted metallocene compounds have the general formula CpMCp' where M is a metal selected from the group consisting of Ru, Os and Fe; Cp is a first substituted cyclopentdienyl or indenyl moiety that includes at least one substituent group D1; Cp' is a second substituted cyclopentadienyl or indenyl moiety that includes at least one substituent group D1'. D1 is different from D1'. D1 is X; Ca1Hb1Xc1; Ca2Hb2Xc2(C=O) Ca1Hb1Xc1; or Ca2Hb2Xc2O Ca1Hb1Xc1, where X is a halogen atom or nitro group; a1 is an integer between 2 and 8; b1 is an integer between 0 and 2 (a1)+1-c1; c1 is an integer between 0 and 2 (a1) + 1 - b1; b1 + c1 is at least 1; a2 is an integer between 0 and 8; b2 is an integer between 0 and 2 (a2) + 1 - c2; and c2 is an integer between 0 and 2 (a2) + 1 - b2; and D1' is X; Ca1Hb1Xc1; Ca2Hb2Xc2(C=O) Ca1Hb1Xc1; or Ca2Hb2Xc2O Ca1Hb1Xc1, where X is a halogen atom or nitro group; a1 is an integer between 1 and 8; b1 is an integer between 0 and 2 (a1) +1 -c1; c1 is an integer between 0 and 2 (a1) +1 -b1; b1 + c1 is at least 1; a2 is an integer between 0 and 8; b2 is an integer between 0 and 2 (a2) + 1 - c2; and c2 is an integer between 0 and 2 (a2) + 1 - b2. The compounds can be employed as precursors in film deposition processes.
申请公布号
WO2004041832(A2)
申请公布日期
2004.05.21
申请号
WO2003US34497
申请日期
2003.10.30
申请人
PRAXAIR TECHNOLOGY, INC.;THOMPSON, DAVID, M.;HOOVER, CYNTHIA, A.