CHEMICALLY AMPLIFIED POLYMER HAVING PENDANT GROUP WITH CAMPHORYL AND RESIST COMPOSITION COMPRISING THE SAME

摘要

The present invention relates to a chemically amplified polymer having a pendent group with camphoryl bonded thereto, a process for the preparation thereof and a resist composition comprising it, and more particularly, to a novel (meth)acrylic or norbornene carboxylate compound with camphoryl bonded thereto, a process for the preparation thereof, a chemically amplified polymer synthesized therewith, and a positive photoresist composition for ArF comprising said polymer with high resolution and excellent etching resistance.