NEGATIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION

摘要

A negative type photosensitive resin composition characterized by comprising an alkali-soluble photosensitive resin (A) having acid groups and having three or more ethylenic double bonds per molecule, an ink repellent (B) comprising a polymer having monomer units (b1) having C20 or lower alkyl in which at least one of the hydrogen atoms has been replaced with a fluorine atom (provided that the alkyl optionally contains ether oxygen) and monomer units (b2) having an ethylenic double bond, and a photopolymerization initiator (C), wherein the ink repellent (B) has a fluorine content of 5 to 25 wt.% and the proportion of the ink repellent (B) is 0.01 to 20 wt.% based on the whole solid components of the negative type photosensitive resin composition. The negative type photosensitive resin composition is excellent in adhesion to substrates, ink repellency, and persistence of the repellency and in alkali solubility and developability.