| 摘要 |
PURPOSE: A lithography is provided, which can prevent the increase of image forming time to a record medium according to the increase of writing zones though a plurality of writing zones are set up. CONSTITUTION: The lithography(100) reads alignment marks of a substrate material(102) deposited on an exposing stage(108) moving in the opposite direction to the scanning direction(S) by CCD cameras(124,126,128) placed on a support gate(122) and then exposes the writing zones of which the locations are read by the alignment marks by a laser beam of a laser scanner(134), wherein the measured distance from the CCD cameras(124,126,128) to the laser scanner(134) in the scanning direction(S) is longer than a pitch of the alignment marks correspondent to the front end and the rear end of the writing zones. |
