| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a thin-film device which can drastically reduce a manufacturing cost by depositing part or the whole of thin films of a thin-film laminated structure used for a liquid crystal display substrate, etc., without using a vacuum treatment apparatus and a method for manufacturing the same. <P>SOLUTION: The thin films of any among insulating films constituting TFTs (Thin-Film Transistors), silicon films and conductive films are formed by coating application of liquid and heat treatment. In a spin coater 102, the surface of a substrate is spin coated with the liquid which is supplied from a coating liquid storage section 105 and contains thin-film components. The substrate coated with the coating liquid is heat treated in a heat treatment section 103 and coating films are formed on the substrate. Further, if the coating films are subjected to laser annealing or the like, the film quality of any of crystallinity, refinement or adhesion properties is improved. <P>COPYRIGHT: (C)2004,JPO</p> |
