发明名称 METHOD AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method and an apparatus for manufacturing a semiconductor device, which transfer conductive particles surely and at a high speed to the semiconductor device. SOLUTION: This apparatus comprises a vessel to contain the conductive particles, a stirring means for stirring the conductive particles in the vessel by air or an inert gas flow, and a mounting jig for mounting the conductive particles. This structure allows the supply of the conductive particles by the use of the air or the inert gas flow to be carried out at high speed. Moreover, since mechanical force is not applied to the conductive particles, damages to the conductive particles are prevented. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004146845(A) 申请公布日期 2004.05.20
申请号 JP20030415872 申请日期 2003.12.15
申请人 RENESAS TECHNOLOGY CORP 发明人 ODAJIMA HITOSHI;HASEGAWA HIROSHI;KAWARADA MASAYUKI;FUKAZAWA HIDEYUKI
分类号 H01L21/60;(IPC1-7):H01L21/60 主分类号 H01L21/60
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