| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a polymer for a resist, which prevents growth and precipitation of foreign matters in preservation with time and has excellent storage stability and is suitable for forming an extremely minute pattern by controlling formation itself of extremely minute slightly soluble substances contained in the polymer for a resist and a resist composition. <P>SOLUTION: In the polymer for a resist obtained by copolymerizing a plurality of polymerizable compounds containing ethylenic double bonds as raw material monomers, the polymer for a resist contains at least a monomer having structure to become alkali soluble by decomposition with an acid and a polar group-containing monomer in the polymerizable compounds and has ≤0.1 mass % of the impurities of a dimer and polymers contained in the whole raw material monomers and ≤0.01 mass % of the impurities of a pentamer and polymers. The radiation-sensitive resist composition comprises the polymer for a resist and a radiation-sensitive acid generator to generate an acid by radiation exposure. <P>COPYRIGHT: (C)2004,JPO |
