发明名称 POLYISOCYANATE DERIVATIVE AND PHOTOCURABLE RESIN COMPOSITION USING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide an epoxy group-containing polyisocyanate derivative having excellent standing stability, and a photocurable resin composition using the polyisocyanate derivative having excellent standing stability, adhesion, and heat resistance. <P>SOLUTION: The polyisocyanate derivative has urethane bonds formed from a polyisocyanate group in a polyisocyanate compound (a1) and each of a hydroxyl group of an epoxy resin (a2) and a hydroxyl group of a hydroxyl group-containing (meth)acrylate (a3). The photocurable resin composition uses the polyisocyanate derivative. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004143275(A) 申请公布日期 2004.05.20
申请号 JP20020309082 申请日期 2002.10.24
申请人 NIPPON SYNTHETIC CHEM IND CO LTD:THE 发明人 KAMIMURA TOMOYUKI
分类号 G03F7/027;C08F290/06;C08G18/67;C08G18/79;G03F7/038 主分类号 G03F7/027
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