| 摘要 |
<P>PROBLEM TO BE SOLVED: To apply fixed procedures to the setting of device parameters and inspection parameters on a visual inspection device for wafers in a semiconductor device manufacturing line. <P>SOLUTION: Inspection images outputted from the visual inspection device and inspection results are processed and accumulated in an image server, and the accumulated data are processed. Appropriate device parameters, appropriate inspection parameters, or portions to be maintained, are determined from the image feature quantities of the inspection images. <P>COPYRIGHT: (C)2004,JPO |
