METHOD FOR MANUFACTURING SILICON MEMBRANE OF MICRO COLUMN ELECTRON BEAM APPARATUS

摘要

PURPOSE: A method for manufacturing a silicon membrane of a micro column electron beam apparatus is provided to be capable of preventing the damage of the membrane and exactly controlling the thickness of the membrane and the size of an electron beam passing hole. CONSTITUTION: A membrane(12) is formed on the entire surface of a wafer(11). A plurality of holes(14) for passing electron beam are formed at the membrane by carrying out a photo etching process using a predetermined mask(13). A silicon nitride layer is deposited on the holes. A plurality of grooves(17) are formed by selectively etching the backside of the wafer using the photo etching process until the silicon nitride layer is exposed. Then, the silicon nitride layer is removed from the resultant structure.