发明名称 SEMICONDUCTOR MANUFACTURING APPARATUS FOR ION IMPLANTATION EQUIPMENT
摘要 PURPOSE: A semiconductor manufacturing apparatus for ion implantation equipment is provided to be capable of preventing wafer detection errors for improving the productivity. CONSTITUTION: A semiconductor manufacturing apparatus is provided with a spin disc(30), a plurality of wafer pads(31) installing at the peripheral portion of the spin disc, and a lifter assembly for loading and unloading a wafer. A sensor hole is vertically formed through the spin disc and the wafer pad and filled with insulation material. A conductive seam is vertically inserted in the center portion of the insulation material. The upper portion of the conductive seam is prolonged from the upper center portion of the insulation material to a predetermined height. The lower portion of the conductive seam is connected with a sensor(42c) of a wafer detecting part on the same vertical line.
申请公布号 KR20040041918(A) 申请公布日期 2004.05.20
申请号 KR20020070027 申请日期 2002.11.12
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, EUN SEOK
分类号 H01L21/265;(IPC1-7):H01L21/265 主分类号 H01L21/265
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