发明名称 |
RESIST PATTERN FORMING METHOD, MANUFACTURING METHOD OF SOLAR CELL USING THE SAME, AND RESIST PATTERN FORMING APPARATUS |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a resist pattern forming method capable of forming a resist pattern excellent in general-purpose properties on a substrate without damaging the substrate, a resist pattern forming apparatus using the same and a manufacturing method for a solar cell capable of stably manufacturing the solar cell in a high yield. <P>SOLUTION: The resist pattern forming method for forming a resist pattern 2 on a substrate 1 by coating the substrate 1 with a resist solution includes a process (i) for holding the substrate 1 almost vertically and a process (ii) which holds a nozzle for coating the substrate 1 with the resist solution almost horizontally, discharges the resist solution from the tip of the nozzle while bringing the tip of the nozzle into contact with the substrate 1 and moves at least one of the substrate 1 and the nozzle to form the predetermined resist pattern 2 on the substrate 1. <P>COPYRIGHT: (C)2004,JPO</p> |
申请公布号 |
JP2004141698(A) |
申请公布日期 |
2004.05.20 |
申请号 |
JP20020306345 |
申请日期 |
2002.10.21 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
SHIMAKAWA SHINICHI;MURO SHINKO;NEGAMI TAKAYUKI |
分类号 |
B05D1/26;B05C5/00;H01L21/027;H01L31/04;(IPC1-7):B05D1/26 |
主分类号 |
B05D1/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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