| 摘要 |
PROBLEM TO BE SOLVED: To measure an optical characteristic of a projection optical system quickly, surely, in high accuracy and reproductivity. SOLUTION: According to a photographed data of an area on an entirely square wafer including a plurality of partitioned areas wherein patterns for measurement are transferred under different conditions, part of a side of an outer frame in the square area is an object to be detected, and a window area is scanned crossing almost orthogonally the side as an detection object, and then the position of the side as an object is detected during the scanning on the basis of a pixel data in the window area (steps 504 to 508). Next, the detection result on the position of the side is used to calculate part of the partitioned area in the outer frame (step 516), and the formation condition of an image in the partitioned area is detected in a short time by using the contrast of an objective and quantitative image. Then, the detected result is used to find out the optical characteristic of a projection optical system. In this case, the optical characteristic can be obtained by using such a mechanism that the exposure condition during transfer of the pattern for measurement varies depending on the partitioned areas. COPYRIGHT: (C)2004,JPO |
