发明名称 PROCESS FOR REMOVING ALUMINOSILICATE MATERIAL FROM SUBSTRATE, AND COMPOSITION USED THEREFOR
摘要 PROBLEM TO BE SOLVED: To remove aluminosilicate-based material (e.g. CMAS) from a substrate. SOLUTION: The aluminosilicate-based material is treated with an aqueous composition having chemical formula H<SB>x</SB>AF<SB>6</SB>(wherein, A is selected from the group consisting of Si, Ge, Ti, Zr, Al and Ga; and x is 1 to 6) and containing at least one acid. Treatment of the substrate is often performed by immersion in an aqueous bath. The process is also very effective in the case of removing CMAS-type materials from cavities in the substrate, such as cooling holes in a gas turbine component. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004143597(A) 申请公布日期 2004.05.20
申请号 JP20030358811 申请日期 2003.10.20
申请人 GENERAL ELECTRIC CO <GE> 发明人 KOOL LAWRENCE BERNARD;FERRIGNO STEPHEN JOSEPH;ZIMMERMAN ROBERT GEORGE JR;ROSENZWEIG MARK ALAN;JOHNSON CURTIS ALAN
分类号 F01D5/28;C23C28/00;C23G1/02;C23G1/04;C23G1/10;F01D25/00;F01D25/12;F02C7/00;F02C7/16;F02C7/18;(IPC1-7):C23G1/04 主分类号 F01D5/28
代理机构 代理人
主权项
地址