| 摘要 |
PROBLEM TO BE SOLVED: To provide a thin-film deposition device for depositing an organic thin-film having uniform thickness on a substrate. SOLUTION: The thin-film deposition device includes a vacuum chamber 11, a substrate holder 12 provided in the vacuum chamber 11, and a tubular gas supply end 22 that supplies gas toward a substrate mounting-face 12a on the substrate holder 12. The gas supply end 22 includes therein a plurality of barriers 42 that blocks the gas supply end 22 toward a gas supply port 21 of the gas supply end 22. Each of the barriers 42 is provided with a plurality of apertures 41. COPYRIGHT: (C)2004,JPO
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