发明名称 SURFACE TREATMENT SYSTEM AND METHOD.
摘要 <p>A surface treatment system in which gas for a deposition reaction is injected into a deposition chamber and power is applied to form a deposition reaction to form a deposition layer at a surface of an object of surface treatment, wherein the deposition chamber has a plurality of deposition spaces disposed in parallel and a convey unit for conveying one or more objects of surface treatment to each deposition space or discharging the objects of surface treatment from each deposition space after a deposition reaction.</p>
申请公布号 MXPA04001104(A) 申请公布日期 2004.05.20
申请号 MX2004PA01104 申请日期 2002.12.28
申请人 LG ELECTRONICS INC. 发明人 CHEON-SOO CHO
分类号 C23C16/44;C23C16/455;C23C16/54;(IPC1-7):C23C16/44 主分类号 C23C16/44
代理机构 代理人
主权项
地址