| 摘要 |
PROBLEM TO BE SOLVED: To provide an endpoint detecting method for a plasma treatment, capable of dealing with a shift of an emitted light wavelength in a simplified construction using a band-pass filter, of improving monitoring accuracy and of ensuring the low cost. SOLUTION: The endpoint detecting method for a plasma treatment comprises the steps following: a transmission process where a transmission wavelength is changed using an incident angle changing means for changing the incident angle from a plasma light source to be monitored as a band-pass filter for selectively transmitting only a specified wavelength region; a detection process where light transmitted in the transmission process is detected with a detector; and a calculation output process where there are compared and calculated states before and after a reaction even when the incident angle is changed by inputting a detection output from the detector in the detection process and an angle output from the incident angle changing means in the transmission process, the detected output of the transmission wavelength becomes a value obtained without any change in the incident angle, and the end point of the plasma treatment is outputted to an output apparatus. COPYRIGHT: (C)2004,JPO
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