INDUCTIVELY COUPLED PLASMA SOURCE FOR PROCESSING LARGE AREA PROVIDED WITH MAGNETIC FIELD REINFORCED EXTERNAL TYPE LINEAR ANTENNA

摘要

PURPOSE: An inductively coupled plasma source for processing a large area provided with a magnetic field reinforced external type linear antenna is provided to increase the moving path due to the spiral motion of the electrons by optimally coupling the electric field and the magnetic field in the reaction chamber, thereby increasing the collision probability between the electrons and the neutrons. CONSTITUTION: An inductively coupled plasma source for processing a large area provided with a magnetic field reinforced external type linear antenna includes a reaction chamber(10), a dielectric material layer(30) and a plurality of linear antenna(40a- 40b). The dielectric material layer(30) is formed on the top and outside surface of the reaction chamber(10). And, the plurality of linear antenna(40a- 40b) is horizontally placed on the dielectric material layer(30) at regular space and forms an electric field by applying an induced power.