发明名称 |
Method and apparatus for reducing non-uniformities in the manufacture of semiconductive devices |
摘要 |
The non-uniformity edge effect that can affect the quality of chips near the edge of a semiconductor wafer of various steps in the manufacture of integrated circuits is reduced. This is achieved by increasing the field area exposed by a step and repeat printer only when printing squares for chips located near the wafer edge. As a result there is also printed for processing an additional non-functional area outside the functional area to reduce the non-uniformity effect. This increases throughput of the printing apparatus. <IMAGE> |
申请公布号 |
EP1048984(A3) |
申请公布日期 |
2004.05.19 |
申请号 |
EP20000106650 |
申请日期 |
2000.03.29 |
申请人 |
INFINEON TECHNOLOGIES AG;INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
SCHULZE, STEFFEN;ZACH, FRANZ |
分类号 |
G03F1/08;G03F7/20;G03F7/22;H01L21/027;H01L23/544 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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