| 发明名称 |
Lithographic apparatus and device manufacturing method |
| 摘要 |
<p>A map of the surface of a substrate is generated at a measurement station (30). The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid (10). The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment. <IMAGE></p> |
| 申请公布号 |
EP1420300(A2) |
申请公布日期 |
2004.05.19 |
| 申请号 |
EP20030257072 |
申请日期 |
2003.11.10 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
LOF, JOERI;DE SMIT, JOANNES THEODOOR;RITSEMA, ROELOF AEILKO SIEBRAND;SIMON, KLAUS;MODDERMAN, THEODORUS MARINUS;MULKENS, JOHANNES CATHARINUS HUBERTUS;MEIJER, HENDRICUS JOHANNES, MARIA;LOOPSTRA, ERIK ROELOF |
| 分类号 |
G03F7/20;G03F9/00;(IPC1-7):G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
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