发明名称 Semiconductor integrated circuit device having switching misfet and capacitor element and method of producing the same, including wiring therefor and method of producing such wiring
摘要 A method of manufacturing a semiconductor integrated circuit device having a switching MISFET and a capacitor element formed over a semiconductor substrate, such as a DRAM, is disclosed. The dielectric film of the capacitor element is formed to be co-extensive with the capacitor electrode layer over it. The upper electrode of the capacitor element is formed to be larger than the lower electrode.
申请公布号 US6737318(B2) 申请公布日期 2004.05.18
申请号 US20010998654 申请日期 2001.12.03
申请人 HITACHI, LTD. 发明人 MURATA JUN;TADAKI YOSHITAKA;ASANO ISAMU;HORIUCHI MITSUAKI;SUGIURA JUN;KANEKO HIROKO;SHIMIZU SHINJI;HIRAIWA ATSUSHI;OGISHI HIDETSUGU;SAGAWA MASAKAZU;OZAWA MASAMI;SEKIGUCHI TOSHIHIRO
分类号 H01L27/105;H01L27/108;(IPC1-7):H01L21/824 主分类号 H01L27/105
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