发明名称 |
Semiconductor integrated circuit device having switching misfet and capacitor element and method of producing the same, including wiring therefor and method of producing such wiring |
摘要 |
A method of manufacturing a semiconductor integrated circuit device having a switching MISFET and a capacitor element formed over a semiconductor substrate, such as a DRAM, is disclosed. The dielectric film of the capacitor element is formed to be co-extensive with the capacitor electrode layer over it. The upper electrode of the capacitor element is formed to be larger than the lower electrode. |
申请公布号 |
US6737318(B2) |
申请公布日期 |
2004.05.18 |
申请号 |
US20010998654 |
申请日期 |
2001.12.03 |
申请人 |
HITACHI, LTD. |
发明人 |
MURATA JUN;TADAKI YOSHITAKA;ASANO ISAMU;HORIUCHI MITSUAKI;SUGIURA JUN;KANEKO HIROKO;SHIMIZU SHINJI;HIRAIWA ATSUSHI;OGISHI HIDETSUGU;SAGAWA MASAKAZU;OZAWA MASAMI;SEKIGUCHI TOSHIHIRO |
分类号 |
H01L27/105;H01L27/108;(IPC1-7):H01L21/824 |
主分类号 |
H01L27/105 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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