System for inspecting EUV lithography masks

摘要

A system for inspecting lithography masks utilizing a laser source to produce a coherent electromagnetic radiation pulse. The pulse is passed to a target which creates a plasma resulting in an extreme ultraviolet (EUV) beam. The beam is condensed and passed through an aperture to define a cross-sectional area of the condensed EUV beam on a lithography mask. A transmission zone plate resolves the image reflected from the lithography mask and passes the image to a detector for analysis.