| 摘要 |
A plasma display device comprises a first panel provided with discharge sustaining electrodes and a dielectric layer on the inside thereof, and a second panel laminated on the first panel so as to form discharge spaces on the inside, wherein the dielectric layer comprises a silicon oxide layer having a density of not less than 6.1x10<22 >atoms/cm<3>. Preferably, the density of the silicon oxide layer is not less than 6.4x10<22 >atoms/cm<3>. Where a sputtering method is used as a method of forming the silicon oxide layer, the concentration of oxygen gas in an atmosphere gas introduced into the sputtering apparatus is controlled to be 5 to 30 vol % during film formation. |
