发明名称 |
Notch inspection apparatus and method based on shading pattern matching |
摘要 |
A notch inspection method based on shading pattern matching for inspecting notches on semiconductor packages or like objects. A template is created to characteristically express brightness gradations of a notch edge in a picture, i.e., to represent the notch edge in pixels constituting contiguous bright and dark portions of the edge. The template may be created on the basis of notch size information or notch size measurements. The template is checked against pictures under inspection in shading pattern matching whereby presence of a notch is determined. Computations of shading pattern matching are omitted regarding portions of the notch edge where brightness remains unchanged.
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申请公布号 |
US6738503(B1) |
申请公布日期 |
2004.05.18 |
申请号 |
US20000628659 |
申请日期 |
2000.07.28 |
申请人 |
RENESAS TECHNOLOGY CORP. |
发明人 |
SAKAUE YOSHIKAZU;IJICHI TOSHIYA |
分类号 |
G01B11/24;G01B11/25;G06T7/00;(IPC1-7):G06K9/00 |
主分类号 |
G01B11/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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