METHOD FOR FABRICATING SILICON SOLAR CELL

摘要

PURPOSE: A method for fabricating a silicon solar cell is provided to reduce fabricating cost by decreasing the consumption of a material, and to increase adaptability by maintaining the efficiency of the solar cell. CONSTITUTION: An oxide layer(23) is formed on a p-type silicon substrate(21). A photoresist pattern is formed on the oxide layer formed on the silicon substrate. The oxide layer is etched by using the photoresist pattern. The photoresist pattern is removed and a texturing process is performed. The oxide layer on the silicon substrate is etched. Phosphorous ions are diffused to the front and rear surfaces of the silicon substrate to form an n¬+ semiconductor layer(22). An oxide layer is formed on the n¬+ semiconductor layer on the silicon substrate. Aluminum is deposited on the rear surface of the silicon substrate and is sintered to form a p¬+ semiconductor layer. A photolithography process is performed to form a conductive metal layer in a predetermined region of the front surface of the silicon substrate. A lift-off process is performed. A conductive metal layer is deposited on the rear surface of the silicon substrate to form a rear surface electrode(24). Silver is electroplated on the conductive metal layer on the front surface of the silicon substrate.