发明名称 |
HOLLOW CATHODE TARGET AND METHODS OF MAKING SAME. |
摘要 |
<p>Sputtering targets and methods of making sputtering targets are described. The method includes the steps of: providing a sputtering metal workpiece made of a valve metal; transverse cold-rolling the sputtering metal workpiece to obtain a rolled workpiece; and cold-working the rolled workpiece to obtain a shaped workpiece. The sputtering targets exhibits a substantially consistent grain structure and/or texture on at least the sidewalls.</p> |
申请公布号 |
MXPA03004635(A) |
申请公布日期 |
2004.05.17 |
申请号 |
MX2003PA04635 |
申请日期 |
2001.11.20 |
申请人 |
CABOT CORPORATION |
发明人 |
MICHALUK, CHRISTOPHER, A. |
分类号 |
B21B3/00;C22B5/12;C22F1/00;C22F1/08;C22F1/18;C23C14/34;(IPC1-7):C23C14/00 |
主分类号 |
B21B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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