发明名称 HOLLOW CATHODE TARGET AND METHODS OF MAKING SAME.
摘要 <p>Sputtering targets and methods of making sputtering targets are described. The method includes the steps of: providing a sputtering metal workpiece made of a valve metal; transverse cold-rolling the sputtering metal workpiece to obtain a rolled workpiece; and cold-working the rolled workpiece to obtain a shaped workpiece. The sputtering targets exhibits a substantially consistent grain structure and/or texture on at least the sidewalls.</p>
申请公布号 MXPA03004635(A) 申请公布日期 2004.05.17
申请号 MX2003PA04635 申请日期 2001.11.20
申请人 CABOT CORPORATION 发明人 MICHALUK, CHRISTOPHER, A.
分类号 B21B3/00;C22B5/12;C22F1/00;C22F1/08;C22F1/18;C23C14/34;(IPC1-7):C23C14/00 主分类号 B21B3/00
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