METHOD AND SYSTEM FOR FABRICATING OPTICAL FILM BY USING EXPOSURE LIGHT SOURCE AND REFLECTIVE SURFACE

摘要

PROBLEM TO BE SOLVED: To provide a system and a method improved for optically efficient fabrication of an optical film in which a photoreactive layer is exposed as a part of the film fabrication. SOLUTION: The exposure system (5) aims to fabricate an optical film (40) having a photosensitive layer (20) and a substrate (10) for photoalignment or the like. In the exposure system (5) directs an exposure beam from a light source (1) through the optical film (40), and uses a reflective surface (58) to reflect the exposure energy back through the optical film (40) so as to enhance or otherwise further condition the photoreaction of the photosensitive layer (20). COPYRIGHT: (C)2004,JPO